发明名称 Method and apparatus for the production of a semiconductor compatible ferromagnetic film
摘要 Films of gallium manganese nitride are grown on a substrate by molecular beam epitaxy using solid source gallium and manganese and a nitrogen plasma. Hydrogen added to the plasma provides improved uniformity to the film which may be useful in spin-based electronics.
申请公布号 US6869806(B2) 申请公布日期 2005.03.22
申请号 US20030468720 申请日期 2003.08.21
申请人 WISYS TECHNOLOGY FOUNDATION, INC. 发明人 CUI YONGJIE;LI LIAN
分类号 C30B23/02;H01F10/193;H01L21/00;H01L21/203;H01L21/302;H01L21/461;(IPC1-7):H01L21/00 主分类号 C30B23/02
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