发明名称 Apparatus for processing and observing a sample
摘要 An apparatus for processing and observing a sample has a sample stage for supporting a sample at a preselected location thereof, a focused ion beam irradiation system for irradiating the sample with a focused ion beam along an optical axis to cut out a portion from the sample, and a side entry stage disposed over the sample stage and extending slantingly with respect to the optical axis of the focused ion beam irradiated by the focused ion beam irradiation system. The side entry stage has a microscope sample holder for picking up the cut-out sample portion directly from the preselected location of the sample and for supporting the sample portion. The microscope sample holder is configured to be removed from the side entry stage while supporting the sample portion and to be connected to an entry stage of a microscope device for observing the sample portion.
申请公布号 US6870161(B2) 申请公布日期 2005.03.22
申请号 US20030644696 申请日期 2003.08.20
申请人 SII NANOTECHNOLOGY INC. 发明人 ADACHI TATSUYA;FUJII TOSHIAKI;SAWARAGI HIROSHI;SUGIYAMA YASUHIKO
分类号 G01N1/28;H01J37/20;H01J37/305;(IPC1-7):G01N1/04;H01J37/26 主分类号 G01N1/28
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