发明名称 Scalable MOS field effect transistor
摘要 A field effect transistor and method for making is described incorporating self aligned source and drain contacts with Schottky metal-to-semiconductor junction and a T-shaped gate or incorporating highly doped semiconductor material for the source and drain contacts different from the channel material to provide etch selectivity and a T-shaped gate or incorporating a metal for the source and drain contacts and the oxide of the metal for the gate dielectric which is self aligned.
申请公布号 US6870232(B1) 申请公布日期 2005.03.22
申请号 US20000550990 申请日期 2000.04.17
申请人 INTERNATIONAL BUSINESS MACHINES CORPORATION 发明人 CHAN KEVIN KOK;CHU JACK OON;ISMAIL KHALID EZZELDIN;RISHTON STEPHEN ANTHONY;SAENGER KATHERINE LYNN
分类号 H01L27/095;(IPC1-7):H01L29/94 主分类号 H01L27/095
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