发明名称 |
Method of processing light-sensitive material |
摘要 |
There is disclosed a method of processing a light-sensitive material which comprises exposing a light-sensitive material having at least one light-sensitive layer on a support, and subjecting to development by a dipping system or a coating system, and then, peeling at least the light-sensitive layer off by bringing a peeling material into close contact with the light-sensitive material, wherein the peeling material is a material having a liquid-absorbing rate in which a liquid-absorption amount within 0.1 second after getting in contact with a liquid is 60% or more based on a liquid-absorption amount within 0.2 second after the same.
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申请公布号 |
US6869743(B1) |
申请公布日期 |
2005.03.22 |
申请号 |
US20000712182 |
申请日期 |
2000.11.15 |
申请人 |
MITSUBISHI PAPER MILLS LIMITED |
发明人 |
SUZUKI SHIGEYOSHI;TSUBAI YASUO;KURIU SADAO;MARUYAMA TOSHIHITO;HIRATA KENJI;ASANO MASATO;SAIKAWA MASAHIKO;FURUKAWA AKIRA |
分类号 |
G03F7/34;(IPC1-7):G03C8/50 |
主分类号 |
G03F7/34 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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