发明名称 Method of processing light-sensitive material
摘要 There is disclosed a method of processing a light-sensitive material which comprises exposing a light-sensitive material having at least one light-sensitive layer on a support, and subjecting to development by a dipping system or a coating system, and then, peeling at least the light-sensitive layer off by bringing a peeling material into close contact with the light-sensitive material, wherein the peeling material is a material having a liquid-absorbing rate in which a liquid-absorption amount within 0.1 second after getting in contact with a liquid is 60% or more based on a liquid-absorption amount within 0.2 second after the same.
申请公布号 US6869743(B1) 申请公布日期 2005.03.22
申请号 US20000712182 申请日期 2000.11.15
申请人 MITSUBISHI PAPER MILLS LIMITED 发明人 SUZUKI SHIGEYOSHI;TSUBAI YASUO;KURIU SADAO;MARUYAMA TOSHIHITO;HIRATA KENJI;ASANO MASATO;SAIKAWA MASAHIKO;FURUKAWA AKIRA
分类号 G03F7/34;(IPC1-7):G03C8/50 主分类号 G03F7/34
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