BAKING APPARATUS IN PHOTOLITHOGRAPHY PROCESS AND OPERATING METHOD THEREOF

摘要

A baking apparatus in a semiconductor wafer process and an operating method thereof are provided to improve contamination of an exhaust line by exhausting fumes including photoresist elements from a baking oven to the outside. A baking oven(100) is used for evaporating a solvent of a photoresist coated on a wafer. An exhaust line(120) is connected to the baking oven. A cleaning compound supply unit(110) is installed at one end of the exhaust line. A cleaning compound collection tank(130) is installed at one end of the exhaust line in order to collect the cleaning compound. A vacuum ejector(140) is installed at one end of the exhaust line and is operated together with the cleaning compound collection tank.