发明名称 THIN FILM TRANSISTOR HAVING A BLACK MATRIX AND METHOD FOR FABRICATING A POLYSILICON USED IN TFT
摘要 A TFT(Thin Film Transistor) and a method of manufacturing a polycrystalline silicon used therefor are provided to promote crystallization of an amorphous silicon layer at a low temperature for a short time by using a black matrix layer between an insulating substrate and a buffer layer. A black matrix layer(20) is formed on an insulating substrate(10). A buffer layer(30) is formed on the black matrix layer. A polycrystalline silicon layer(41) is formed on the buffer layer by performing an SPC(Solid Phase Crystallization) on an amorphous silicon layer. An MIHL(Metal Insulator Hybrid Layer) is used as the black matrix layer.
申请公布号 KR20050027466(A) 申请公布日期 2005.03.21
申请号 KR20030063751 申请日期 2003.09.15
申请人 SAMSUNG SDI CO., LTD. 发明人 KOO, JAE BON;LEE, KI YONG;PARK, JI YONG
分类号 H01L29/786;(IPC1-7):H01L29/786 主分类号 H01L29/786
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