PHOTOSENSITIVE COMPOSITION FOR INTERLAYER DIELECTRIC AND METHOD OF FORMING PATTERNED INTERLAYER DIELECTRIC

摘要

A photosensitive composition which has excellent storage stability and gives an interlayer dielectric having an improved thickness limit. The photosensitive composition is characterized by comprising: a modified polysilsesquiazane which is obtained by replacing up to 50 mol% of basic structural units represented by the general formula -[SiR1(NR 2)1.5]- (wherein R1's each independently represents C1-3 alkyl or (un)substituted phenyl; and R2 's each independently represents hydrogen, C1-3 alkyl, or (un) substituted phenyl) by connecting groups other than silazane bonds and which has a weight-average molecular weight of 500 to 200,000; and a photo-acid generator.