发明名称 Method, apparatus and computer product for substrate processing
摘要 A method, apparatus and computer product for processing of substrates in at least a part of a substrate processing system is provided. In an embodiment, the method includes obtaining, using a processing unit, at least one of a rate of processing and a time of processing of a plurality of substrate lots to be introduced into a part of the substrate processing system and determining, using the processing unit, an order of introduction of the plurality of substrate lots into the part of the substrate processing system to at least one of increase the rate of processing and decrease the time of processing of the plurality of substrate lots.
申请公布号 US2005058446(A1) 申请公布日期 2005.03.17
申请号 US20030662881 申请日期 2003.09.16
申请人 ASML NETHERLANDS B.V. 发明人 PLUG REINDER TEUN
分类号 H01L21/02;G03F7/20;(IPC1-7):G03D5/00;G03B27/32 主分类号 H01L21/02
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