发明名称 |
Method and apparatus for repair of reflective photomasks |
摘要 |
A method of selectively ablating an undesired material from a substrate includes providing a substrate with two regions; providing laser pulses; tuning a wavelength of the laser pulses to match a desired wavelength characteristic of a material and directing the tuned laser pulses onto the substrate; and controlling a pulse duration, wavelength, or both, of the laser pulses to ablate the undesired material without damaging the substrate or any adjacent material. In another embodiment, an apparatus for repairing a defect on a reflective photomask includes a femtosecond pulse width laser; a harmonic conversion cell; a filter for passing a selected EUV harmonic of the laser light; a lens arrangement configured to direct the selected EUV harmonic of the laser light onto the photomask; and a control unit connected to the laser to control an ablation of the defect on the reflective photomask.
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申请公布号 |
US2005056625(A1) |
申请公布日期 |
2005.03.17 |
申请号 |
US20030660477 |
申请日期 |
2003.09.12 |
申请人 |
INTERNATIONAL BUSINESS MACHINES |
发明人 |
HAIGHT RICHARD A.;LONGO PETER P.;WAGNER ALFRED |
分类号 |
B23K26/06;B23K26/40;G03F1/00;(IPC1-7):B23K26/36 |
主分类号 |
B23K26/06 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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