MANUFACTURING METHOD FOR GLASS SUBSTRATE FOR ELECTRONIC DEVICE, MANUFACTURING METHOD FOR MASK BLANK, AND MANUFACTURING METHOD FOR TRANSFER MASK

摘要

PROBLEM TO BE SOLVED: To provide manufacturing methods for a glass substrate for an electronic device and a mask blank with which no fine uneven surface defect occurs on a substrate surface or a failure rate is low, and a manufacturing method for a transfer mask free from a phase defect or a pattern defect caused by the fine uneven surface defect on the substrate surface.

SOLUTION: The glass substrate for an electronic device is manufactured by pushing polishing surface plates 5 and 6 with a polishing pad 7 glued against the glass substrate and relatively moving the plates 5 and 6 and the glass substrate while feeding a polishing fluid containing colloidal silica abrasive grains thereby precision-polishing the substrate surface. The polishing pad 7 used in precision-polishing has a base material and a nap layer having a fine aperture on the surface with a thickness of 700 μm or more. Hardness of the pad (Asker-C) is 65 or less. A mask blank and a transfer mask are manufactured by using the glass substrate thus manufactured.

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