| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide an exposure method for improving throughput by reducing the travel path of a reticle stage when scanning a reticle. <P>SOLUTION: When scanning and exposing a first chip, exposure is started from a start point P1 in a first stripe 11 of the first reticle 10, and exposure is made by folding back and tracing the entire stripes of the first reticle 10 and the second reticle 20, thus reaching an end point P16 of four stripes 24 of the second reticle 20. When exposing the second chip, exposure is started from the end point P16 of the fourth stripe 24 of the second reticle 20, entire strips of the second reticle 20 and the first reticle 10 are exposed by following a path opposite to the one when exposing the first chip, thus reaching the start point P1 of the first stripe 11 of the first reticle 10. <P>COPYRIGHT: (C)2005,JPO&NCIPI</p> |
