发明名称 |
Method for forming a micro pattern, micro pattern, method for fabricating a mold for forming the micro pattern through transcription, and mold for forming the micro pattern through transcription |
摘要 |
An organic monomolecular film is formed on a first substrate, and micro processed using photolithography technique to form an organic mono-molecular film pattern. Then, a thin film is selectively grown on the organic monomolecular film pattern, and transcribed onto a second substrate to form a micro pattern made of the thin film on the second substrate.
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申请公布号 |
US2005058951(A1) |
申请公布日期 |
2005.03.17 |
申请号 |
US20040901078 |
申请日期 |
2004.07.29 |
申请人 |
NATIONAL UNIVERSITY CORPORATION NAGOYA UNIVERSITY |
发明人 |
SUGIMURA HIROYUKI;SAITO NAGAHIRO;TAKAI OSAMU |
分类号 |
C23C18/16;G03F7/00;G03F7/16;G03F7/40;H01L21/027;H05K3/20;(IPC1-7):G03F7/00 |
主分类号 |
C23C18/16 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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