发明名称 Method for forming a micro pattern, micro pattern, method for fabricating a mold for forming the micro pattern through transcription, and mold for forming the micro pattern through transcription
摘要 An organic monomolecular film is formed on a first substrate, and micro processed using photolithography technique to form an organic mono-molecular film pattern. Then, a thin film is selectively grown on the organic monomolecular film pattern, and transcribed onto a second substrate to form a micro pattern made of the thin film on the second substrate.
申请公布号 US2005058951(A1) 申请公布日期 2005.03.17
申请号 US20040901078 申请日期 2004.07.29
申请人 NATIONAL UNIVERSITY CORPORATION NAGOYA UNIVERSITY 发明人 SUGIMURA HIROYUKI;SAITO NAGAHIRO;TAKAI OSAMU
分类号 C23C18/16;G03F7/00;G03F7/16;G03F7/40;H01L21/027;H05K3/20;(IPC1-7):G03F7/00 主分类号 C23C18/16
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