发明名称 A HYBRID MAGNETIC/ELECTROSTATIC DEFLECTOR FOR ION IMPLANTATION SYSTEMS
摘要 A magnetic deflector for an ion beam is disclosed and comprises first and second coils. The coils are positioned above and below the beam, respectively, and extend along a width of the beam. Current passes through the coils to generate a magnetic field therebetween that is generally perpendicular to a direction of travel of the beam along substantially the entire width thereof. In another aspect of the invention, a method of deflecting a beam prior to implantation into a workpiece is disclosed. The method includes determining one or more properties associated with the beam and selectively activating one of a magnetic deflection module and an electrostatic deflection module based on the determination. Plasma may be introduced for reducing space charge.
申请公布号 WO2004114354(A3) 申请公布日期 2005.03.17
申请号 WO2004US18788 申请日期 2004.06.14
申请人 AXCELIS TECHNOLOGIES INC.;BENVENISTE, VICTOR;RATHMELL, ROBERT;HUANG, YOUGZHANG 发明人 BENVENISTE, VICTOR;RATHMELL, ROBERT;HUANG, YOUGZHANG
分类号 H01J27/18;H01J37/00;H01J37/05;H01J37/147;H01J37/30;H01J37/317 主分类号 H01J27/18
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