发明名称 |
METHOD OF HEATING A SUBSTRATE IN A VARIABLE TEMPERATURE PROCESS USING A FIXED TEMPERATURE CHUCK |
摘要 |
A method is provided for heating a substrate in a process chamber using a heated chuck. In accordance with the method, the substrate is lowered onto the chuck and heated to a first temperature less than a temperature of the chuck. The substrate is then raised away from the chuck, and a process is carried out on the substrate while the substrate is supported above the chuck. The substrate is then lowered back to the chuck and heated to a second temperature greater than the first temperature for further processing of the substrate. |
申请公布号 |
WO2004025710(A3) |
申请公布日期 |
2005.03.17 |
申请号 |
WO2003US28728 |
申请日期 |
2003.09.10 |
申请人 |
AXCELIS TECHNOLOGIES, INC.;COX, GERALD |
发明人 |
COX, GERALD |
分类号 |
H01L21/027;G03F7/42;H01L21/00;H01L21/02 |
主分类号 |
H01L21/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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