发明名称 PATTERN MANUFACTURING METHOD FOR ELECTRIC INSULATING FILM AND ELECTRONIC DEVICE
摘要 PROBLEM TO BE SOLVED: To provide the pattern manufacturing method for electric insulating film, which is capable of surely effecting pattern forming of an electric insulating film having a penetrating connection hole for arranging an electric connecting unit of electric wiring without employing etching treatment, and an electronic device. SOLUTION: The pattern manufacturing method for the electric insulating film, wherein the electric insulating film 34 having the penetrating connection hole on the first conductive film 21 of the substrate 20 to arrange the electric connection unit for electrically connecting the first conducting film 21 of the substrate 20 to a second conductive film, is formed, comprises a mask forming step, forming a mask material 70 having liquid repelling property on a pattern forming unit on the first conductive film 21, an electric insulating film forming step ST2, forming an electric insulating film 34 by applying and drying a liquid electric insulating material 80 on the mask material 70 having liquid repelling property and the first conductive film 21, and a mask material removal step ST3, providing the electric insulating film 34 with the penetrating connection hole by removing the mask material 70. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005072360(A) 申请公布日期 2005.03.17
申请号 JP20030301626 申请日期 2003.08.26
申请人 SEIKO EPSON CORP 发明人 SEKI SHINSUKE;YUDASAKA KAZUO;SATO MITSURU
分类号 H05K3/46;H01L21/3065;H01L21/768;(IPC1-7):H01L21/306 主分类号 H05K3/46
代理机构 代理人
主权项
地址