发明名称 METHOD FOR FORMING METAL OXIDE COATING FILM AND VAPOR DEPOSITION APPARATUS
摘要 <p>A photocatalyst composite material having a titanium oxide photocatalyst coating film on the surface of a base is produced by a CVD method wherein a TiCl4 vapor is reacted with a water vapor. The TiCl4 vapor and the water vapor are sprayed into a deposition chamber (9) respectively from nozzles (5) and (6) so that the spray streams of these vapors meet and thus are mixed with each other before reaching the base. The mixed vapor is brought into contact with a base (1) which is moving in one direction within 3 seconds from the mixing. It is preferable to spray the TiCl4 vapor from a porous nozzle (5) in a direction opposite to the moving direction of the base while it is preferable to spray the water vapor from a slit nozzle (6) whose crossing angle to the base is smaller than that of the porous nozzle (5).</p>
申请公布号 WO2005005686(A8) 申请公布日期 2005.03.17
申请号 WO2004JP09903 申请日期 2004.07.06
申请人 SUMITOMO TITANIUM CORPORATION;SHIMOSAKI, SHINJI;OGASAWARA, TADASHI;NAGAOKA, SADANOBU;MASAKI, YASUHIRO 发明人 SHIMOSAKI, SHINJI;OGASAWARA, TADASHI;NAGAOKA, SADANOBU;MASAKI, YASUHIRO
分类号 C01B13/14;B01J21/06;B01J35/00;B01J35/02;B01J37/02;C01G23/04;C01G23/07;C23C16/40;C23C16/44;C23C16/455;C23C16/54;C23C16/56;(IPC1-7):C23C16/40 主分类号 C01B13/14
代理机构 代理人
主权项
地址