A fluid control system for immersion lithography is formed with an optical member (4) such as a lens, a workpiece (W) such as a semiconductor wafer with a surface disposed opposite to the optical member with a gap in between, a fluid-supplying device (21) for providing an immersion fluid (7) such as water to a specified exposure area (40) in the gap, and a fluid control device (25) that activates a force on the fluid so that the immersion fluid is retained in the exposure area and its vicinity at least while the immersion lithography operation is being carried out. A pressured gas may be caused to apply a hydrodynamic force on the fluid to keep it in its place.
申请公布号
WO2004093159(A3)
申请公布日期
2005.03.17
申请号
WO2004US09911
申请日期
2004.03.29
申请人
NIKON CORPORATION;COON, DEREK;HAZELTON, ANDREW, J.