发明名称 |
Simulationsverfahren in einem lithographischen Prozeß |
摘要 |
A simulation method for simulating in a lithographic process is disclosed, and the method can expect a size of a resist pattern by obtaining a diffused aerial image model(DAIM) by determining a simplified model in a aerial image to represent a resist process without simulating full processes including a resist process, and then applying the DAIM to a threshold model. |
申请公布号 |
DE19757696(B4) |
申请公布日期 |
2005.03.17 |
申请号 |
DE1997157696 |
申请日期 |
1997.12.23 |
申请人 |
HYUNDAI ELECTRONICS INDUSTRIES CO., LTD. |
发明人 |
AHN, CHANG NAM;KIM, HEE BOM |
分类号 |
G01R31/26;G03F7/004;G03F7/20;H01J37/305;H01L21/00;H01L21/027 |
主分类号 |
G01R31/26 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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