| 摘要 |
Provided is a positive-typed resist composition which forms patterns with 0.5mum and less in line width interval for 3mum or more thickness of a resist film, therefore it shows high sensitivity and resolving power. In the positive-typed resist composition which includes an alkali soluble novolac resin with a repeating unit represented by formula 1 where m is an integer of 0-3 and a phenolic compound represented by formula 2 where R1 to R8 are independently H, a C1-C6 straight-, branched- or cyclic-alkyl radical or a C1-C6 straight-, branched- or cyclic-alkoxy radical, R9 to R11 are independently H, a C1-C6 straight-, branched- or cyclic-alkyl radical where R10 and R12 are possibly combined each other to form a ring, R12 is H, a C1-C6 straight alkyl radical or a radical represented by formula 3, (in which R13 and R14 are independently H, a C1-C6 straight-, branched- or cyclic-alkyl radical or a C1-C6 straight-, branched- or cyclic-alkoxy radical and d is an integer of 1-3), R12 and R9 are possibly combined each other to form a C3-C6 ring, a and b is an integer of 1-3, c is an integer of 0-3 and n is an integer of 0-3.
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