COMPOSITION FOR REMOVING RESIST FOR COPPER AND REMOVAL METHOD BY USING THE SAME

摘要

PROBLEM TO BE SOLVED: To provide a composition for removing a resist for copper, the composition preventing the corrosion of copper and removing a resist for copper without causing corrosion between lower films of two copper films, and to provide a method of use of the composition. SOLUTION: The composition for removing a resist for copper contains about 10 wt.% to 30 wt.% liquid of an amine compound including an alkanol amine, about 10 to 80 wt.% of a glycol group solvent, about 9.5 to 79 wt.% of a polar solvent, and about 0.5 to 10 wt.% of a corrosion inhibitor. COPYRIGHT: (C)2005,JPO&NCIPI