发明名称 SILICON PRODUCTION APPARATUS
摘要 PROBLEM TO BE SOLVED: To provide a compact-sized silicon production apparatus capable of efficiently producing silicon. SOLUTION: The production apparatus of polycrystalline silicon has a reaction tube 2 of which the base material is a carbon material and into which chlorosilanes and hydrogen are supplied to react with each other to deposit silicon on the inner surface of the tube and a high-frequency heating coil 3 for heating the reaction tube 2. In the production apparatus, a plurality of reaction tubes 2 are arranged in parallel; and a high-frequency heating coil 4 is wound on the outer periphery of a reaction tube part 2a formed by these reaction tubes 2 with some clearance between the coil and each reaction tube 2. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005067939(A) 申请公布日期 2005.03.17
申请号 JP20030298642 申请日期 2003.08.22
申请人 TOKUYAMA CORP 发明人 NAKAJIMA JUNICHIRO;ODA HARUYUKI
分类号 C01B33/035;F27B17/00;F27D11/06;(IPC1-7):C01B33/035 主分类号 C01B33/035
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