| 摘要 |
PROBLEM TO BE SOLVED: To provide a method for forming a pattern easily with high precision by suppressing charging of an insulating film easily. SOLUTION: At first, a first conductive film 5 is provided on a substrate 1 to be processed and a second film 6 having an acid spread preventive function is provided on the first film 5. A third photosensitive film 7 is then provided on the second film 6. Subsequently, the third film 7 is irradiated with an energy beam and patterned and then the patterned third film 7 is developed, thus forming a pattern 8 on the third film 7. COPYRIGHT: (C)2005,JPO&NCIPI
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