| 摘要 |
PROBLEM TO BE SOLVED: To provide quartz glass excellent in ultraviolet ray absorption property, visible light transmittance, resistance to devitrification, and thermal resistance, and to provide a method for manufacturing the same. SOLUTION: The quartz glass is characterized in that the content of OH groups is≤1 ppm, the content of H<SB>2</SB>is≤1×10<SP>17</SP>/cm<SP>3</SP>, the content of Cl is≤10 ppm, the total content of metal impurities is≤10 ppm, the transmittance per thickness of 1 cm in a wavelength region of≤230 nm is≤5%, and the transmittance per thickness of 1 cm in a wavelength region of≥300 nm is≥80%. The quartz glass can be obtained by a process comprising hydrolyzing a glass forming raw material in oxyhydrogen flame, forming a porous silica body (soot body) by depositing formed silica particulates on a target, subjecting the obtained soot body to heat treatment in an atmosphere containing gaseous hydrogen, and transparently vitrifying so as to obtain transparent quartz glass, and by irradiating the obtained transparent quartz glass with X-ray orγ-ray of an irradiation dose of≥4×10<SP>4</SP>C/kg. COPYRIGHT: (C)2005,JPO&NCIPI
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