发明名称 |
Selecting a hypothetical profile to use in optical metrology |
摘要 |
A hypothetical profile is used to model the profile of a structure formed on a semiconductor wafer to use in determining the profile of the structure using optical metrology. To select a hypothetical profile, sample diffraction signals are obtained from measured diffraction signals of structures formed on the wafer, where the sample diffraction signals are a representative sampling of the measured diffraction signals. A hypothetical profile is defined and evaluated using a sample diffraction signal from the obtained sample diffraction signals.
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申请公布号 |
US2005057748(A1) |
申请公布日期 |
2005.03.17 |
申请号 |
US20030663300 |
申请日期 |
2003.09.15 |
申请人 |
TIMBRETECHNOLOGIES, INC. |
发明人 |
VUONG VI;BAO JUNWEI;DODDI SRINI;DREGE EMMANUEL;WEN JIN;YEDUR SANJAY;CHIN DORIS;JAKATDAR NICKHIL;LANE LAWRENCE |
分类号 |
G01B11/24;G01B11/30;G01N21/00;G01N21/17;G01N21/84;G01N21/956;G01R31/26;G06F19/00;H01L21/02;H01L21/66;(IPC1-7):G01N21/00 |
主分类号 |
G01B11/24 |
代理机构 |
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地址 |
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