METHOD FOR PRODUCING AT LEAST ONE CAVITY IN A MATERIAL

摘要

The invention relates to a method for producing at least one cavity in a material (1) having a hexagonal or cubic crystallographic structure, especially a carbide and/or a material containing silicon, said method comprising the following steps: at least one initial etching point (2) is formed in the material (1) on at least one pre-determined site (3), and the cavity is etched from the initial point (2) previously formed by exposing the material to a reducing environment.