发明名称 Projection lens for microlithography scans a pattern set up in a projection lens object plane into a projection lens focal plane
摘要 <p>Between an object plane and a focal plane there is a polarizing separator device (40,42) that operates only once in transmission or reflection as a transparent optical element with a polarizing separator structure in such a way that only light with a polarizing alignment can pass through this optical element.</p>
申请公布号 DE10338983(A1) 申请公布日期 2005.03.17
申请号 DE2003138983 申请日期 2003.08.20
申请人 CARL ZEISS SMT AG 发明人 ULRICH, WILHELM;FUERTER, GERHARD;GERHARD, MICHAEL
分类号 G02B13/14;G02B17/08;G02B27/28;G03F7/20;(IPC1-7):G02B17/08 主分类号 G02B13/14
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