发明名称 |
Projection lens for microlithography scans a pattern set up in a projection lens object plane into a projection lens focal plane |
摘要 |
<p>Between an object plane and a focal plane there is a polarizing separator device (40,42) that operates only once in transmission or reflection as a transparent optical element with a polarizing separator structure in such a way that only light with a polarizing alignment can pass through this optical element.</p> |
申请公布号 |
DE10338983(A1) |
申请公布日期 |
2005.03.17 |
申请号 |
DE2003138983 |
申请日期 |
2003.08.20 |
申请人 |
CARL ZEISS SMT AG |
发明人 |
ULRICH, WILHELM;FUERTER, GERHARD;GERHARD, MICHAEL |
分类号 |
G02B13/14;G02B17/08;G02B27/28;G03F7/20;(IPC1-7):G02B17/08 |
主分类号 |
G02B13/14 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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