APPARATUS AND METHOD FOR CLEANING SEMICONDUCTOR SUBSTRATE

摘要

PROBLEM TO BE SOLVED: To provide an apparatus and a method for cleaning a semiconductor substrate, which prevent IPA vapor from condensing in a chamber and can efficiently dry the wafer. SOLUTION: This invention is related to an apparatus and a method for cleaning a semiconductor substrate. The apparatus has a chamber equipped with an exhaust path through which IPA vapor that flows into the inside is discharged. The opening rate of the exhaust path is adjusted according to the pressure in the chamber during processing. COPYRIGHT: (C)2005,JPO&NCIPI