| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a positive resist composition having solubility contrast sufficient for practical use and suppressing pattern collapse, and to provide a method for forming a pattern. <P>SOLUTION: The positive resist composition contains: (A1) a resin component which contains a star branched polymer having polymer chains extending in three or more directions from a lower alkyl molecule, and which shows the solubility with an alkali increased by the effect of an acid, or (A2) a resin component which contains a star branched polymer obtained by polymerization of monomers containing a (meth)acrylic acid ester in the presence of a polyfunctional chain transfer agent having three or more functional groups and which shows the solubility with an alkali increased by the effect of an acid; (B) an acid generating component which generates an acid by exposure; and (C) an organic solvent. The method for forming a resist pattern is carried out by forming a layer comprising the above positive resist composition on a substrate, preliminarily baking the layer, selectively exposing, heating after exposure and developing with an alkali. <P>COPYRIGHT: (C)2005,JPO&NCIPI |
