发明名称 Systems and methods for fabricating microstructures by imaging a radiation sensitive layer sandwiched between outer layers, and microstructures fabricated thereby
摘要 Microstructures are fabricated by imaging a microstructure master blank that includes a radiation sensitive layer sandwiched between a pair of outer layers, on an imaging platform, to define the microstructures in the radiation sensitive layer. At least one of the outer layers is then removed. The microstructures that were defined in the radiation sensitive layer are developed. The radiation sensitive layer sandwiched between the pair of outer layers may be fabricated as webs, to provide microstructure master blanks.
申请公布号 US2005058949(A1) 申请公布日期 2005.03.17
申请号 US20030661974 申请日期 2003.09.11
申请人 WOOD ROBERT L.;RINEHART THOMAS A.;FREESE ROBERT P. 发明人 WOOD ROBERT L.;RINEHART THOMAS A.;FREESE ROBERT P.
分类号 G02B3/00;G02B5/18;G03F7/00;G03F7/09;G03F7/16;(IPC1-7):G03C5/00 主分类号 G02B3/00
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