| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a positive resist composition which suppresses pattern falling, when a fine pattern is resolved and a pattern forming method, using the same. <P>SOLUTION: The positive resist composition contains (A) a resin having a dissolution rate in an alkali developer increased by the action of an acid, (B) a compound which generates an acid upon irradiation with actinic ray or radiation, and (C) a cycloaliphatic hydrocarbon compound having a cyano group. The pattern forming method uses this composition. <P>COPYRIGHT: (C)2005,JPO&NCIPI |
