发明名称 Suppressing monovalent metal ion migration using aluminum-containing barrier layer
摘要 Disclosed is a process for suppressing monovalent metal ion migration between inorganic materials by placing a barrier layer containing Al2O3 and SiO2 between the inorganic materials. Also disclosed is a process for making silica-containing body comprising a step of forming a barrier layer containing Al2O3 and SiO2 over the soot-receiving substrate before the laydown of the fused silica boule. The barrier layer is effective in suppressing monovalent metal ion, especially alkali metal ion, particularly sodium migration at elevated temperature. The processes are particularly useful in the production and working of HPFS(R) materials required of a very low alkali metal, especially sodium, concentration.
申请公布号 US2005056806(A1) 申请公布日期 2005.03.17
申请号 US20040936054 申请日期 2004.09.07
申请人 ELLISON ADAM J. G.;BOEK HEATHER D. 发明人 ELLISON ADAM J. G.;BOEK HEATHER D.
分类号 C03C17/25;C03C17/34;(IPC1-7):C03C3/06 主分类号 C03C17/25
代理机构 代理人
主权项
地址