发明名称 POSITION ADJUSTMENT SYSTEM AND METHOD, RECORDING MEDIUM, PROGRAM, AND PROJECTOR
摘要 <p><P>PROBLEM TO BE SOLVED: To provide a position adjustment system by which accuracy in the position adjustment of a light emitting tube and a reflector can be improved, and to provide a position adjustment method, a recording medium, and a program. <P>SOLUTION: The position adjustment of a sub-mirror 13 and a light emitting tube 11 and the position adjustment of the elliptic reflector 12 and the tube 11 are carried out with a position adjustment device 6. Power and luminance needed for the amount of position adjustment are measured to calculate the value of luminous flux/power. The amount of position adjustment and the characteristic of the average of the luminous flux/power are obtained. On the basis of that, an optimum position is calculated by an optimum-position detecting part 645. Further, an amount of displacement between the present position of the sub-mirror 13 and its optimum position obtained from an approximation curve is calculated. <P>COPYRIGHT: (C)2005,JPO&NCIPI</p>
申请公布号 JP2005070503(A) 申请公布日期 2005.03.17
申请号 JP20030301245 申请日期 2003.08.26
申请人 SEIKO EPSON CORP 发明人 YAMAGUCHI HIDEO;KOBAYASHI HIROYUKI;FUJISAWA SHOHEI
分类号 G03B21/14;F21S2/00;F21V13/00;F21Y101/00;G03B21/00;(IPC1-7):G03B21/14 主分类号 G03B21/14
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