发明名称 DUAL-STEP PROCESS OF INDUSTRIAL ENTERPRISE STACK GAS DECONTAMINATION CONTAINING ELECTRON BEAM IRRADIATION AND TREATMENT BY GAS DISCHARGE
摘要 A system for removing sulfur dioxide (S02) and nitrogen oxides (NOx) from the gases of a gas stream using irradiation of the gases with a particle accelerator in combination with gas discharge. The system treats the gases in a first stage using gas discharge lighted by a first electron beam from a first particle accelerator and in a second stage with a second electron beam from a second particle accelerator. By so lighting the gases between energized electrodes and preliminarily ionizing the gases, a stable, uniform gas discharge is maintained in an ammonia-rich environment at near atmospheric pressure during the first stage, thereby enabling a significant reduction in the amount of sulfur dioxide (S02) present in the gases. By significantly reducing the amount of sulfur dioxide (S02) in the first stage, the energy required to remove a substantial amount of nitrogen oxides (NOx) during the second stage is reduced substantially.
申请公布号 WO2005023415(A1) 申请公布日期 2005.03.17
申请号 WO2004US29057 申请日期 2004.09.03
申请人 SCANTECH HOLDINGS, LLC;KLENOV, GENNADIY, IVANOVITCH;LARIONOV, VLADIMIR, PETROVICH;KADYMOV, AZIZ, KHASAEVICH;BOWSER, GARY, F. 发明人 KLENOV, GENNADIY, IVANOVITCH;LARIONOV, VLADIMIR, PETROVICH;KADYMOV, AZIZ, KHASAEVICH;BOWSER, GARY, F.
分类号 B01D53/00;B01D53/32;B01J19/08;G21K5/10;H05H1/24 主分类号 B01D53/00
代理机构 代理人
主权项
地址