发明名称 METHOD AND APPARATUS FOR PRODUCING EXTREME ULTRAVIOLETT RADIATION OR SOFT X-RAY RADIATION
摘要 A method of producing extreme ultraviolet radiation (EUV) or soft X-ray radiation by means of an electrically operated discharge, in particular for EUV lithography or for metrology, in which a plasma (22) is ignited in a gaseous medium between at least two electrodes (14, 16) in a discharge space (12), said plasma emitting said radiation that is to be produced. In order to provide a method of the abovementioned type which is free of the disadvantages of the prior art and at the same time allows greater radiation power without high electrode wear, it is proposed that said gaseous medium is produced from a metal melt (24), which is applied to a surface in said discharge space (12) and at least partially evaporated by an energy beam, in particular by a laser beam (20).
申请公布号 WO2005025280(A2) 申请公布日期 2005.03.17
申请号 WO2004IB51651 申请日期 2004.09.01
申请人 KONINKLIJKE PHILIPS ELECTRONICS N. V.;FRAUNHOFER-GESELLSCHAFT ZUR FOERDERUNG DER ANGEWANDTEN FORSCHUNG E.V.;JONKERS, JEROEN;VAUDREVANGE, DOMINIK MARCEL;NEFF, WILLI 发明人 JONKERS, JEROEN;VAUDREVANGE, DOMINIK MARCEL;NEFF, WILLI
分类号 H05G2/00 主分类号 H05G2/00
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