| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a treating device that can solve the problem that the conventional treating device is bad in the reproducibility of a process. <P>SOLUTION: The treating device is provided with a susceptor 2 on which an object W to be treated is placed, a particle supplying means 20 which supplies at least one of plasma, radical, and charged particles into a treating vessel 1 in which the susceptor 2 is housed, and state-of-particle detecting and controlling means 30 and 35 which detect the state of at least one of the plasma, radical, and charged particles in the treating vessel 1 and control the particle supplying means 20 based on the detected results. The particle supplying means 20 has a hollow cathode electrode member 21, which is constituted in a laminate by laminating a plurality of electrodes upon another, has first through holes formed in the laminate through all electrodes, and produces micro-cathode discharge in the first through holes when a voltage is applied across a pair of facing electrodes, and a gas supplying means 22 which supplies a gas into the first through holes. In addition, the state-of-particle detecting and controlling means 30 and 35 control at least either one of the voltage applied across the pair of electrodes or the gas supplied into the first through holes. <P>COPYRIGHT: (C)2005,JPO&NCIPI |
