| 摘要 |
PROBLEM TO BE SOLVED: To provide a method for cleaning fine particles adhered to a microstructure, using a supercritical fluid as the cleaning solvent. SOLUTION: This method for cleaning a microstructure, using supercritical fluid as a cleaning solvent, contains the microstructure within a cleaning chamber 24 with the distance between the inner wall of the cleaning chamber and the surface of the microstructure on which the fine particles to be removed are adhered being kept equal to 3 mm or smaller, and rotates the microstructure at revolutions 400 per minute of or higher, while introducing the supercritical fluid into the cleaning chamber. The cleaning is performed, with the flow rate introduced into the cleaning chamber which is kept at 1 L/min or larger. COPYRIGHT: (C)2005,JPO&NCIPI
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