METHOD FOR MANUFACTURING SEMICONDUCTOR THIN FILM WITH SURFACE WAVE, AND SEMICONDUCTOR THIN FILM

摘要

PROBLEM TO BE SOLVED: To provide a method for manufacturing a semiconductor thin film using surface waves, which is simple and can reduce the cost and control crystal grain boundary, and to provide a semiconductor thin film. SOLUTION: Preliminary wave motion is generated on a semiconductor thin film surface on a substrate. In this state, spatially periodical crystal grain boundary is formed broadly and stably on the semiconductor thin film surface by the irradiation of a linearly polarized laser beam. COPYRIGHT: (C)2005,JPO&NCIPI