| 摘要 |
PROBLEM TO BE SOLVED: To provide a method of manufacturing a solid image element having a sufficient sensitivity while suppressing variation in sensitivity. SOLUTION: The method of manufacturing a solid image element comprises a step for forming the semiconductor region 14 of a light receiving sensor section 4 on the semiconductor layer 21 of a wafer 20 having a substrate 24 formed by laying a semiconductor substrate 23, an intermediate layer 22 and the semiconductor layer 21, a step for forming a wiring layer 13 on the surface of the semiconductor layer 21, a step for forming a groove 25 in the semiconductor substrate 23 on the rear side of the wafer 20, and a step for removing the intermediate layer 22 and the semiconductor substrate 23 by supplying etching liquid from the groove 25 thereby etching the intermediate layer 22. COPYRIGHT: (C)2005,JPO&NCIPI
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