PHOTOSENSITIVE COMPOSITION AND PATTERN FORMING METHOD USING THE SAME

摘要

Provided is a photosensitive composition which shows wide defocus latitude in forming single-lined patterns and decreases pattern changes in forming minutes patterns with 110nm and less in wavelength. The photosensitive composition is characterized by having a compound which radiates active light or radiant ray to produce sulfonic acid represented by formula (I), in which A1 is a n-valent connection radical; A2 is a single bond or a bivalent aliphatic radical and same or different where one or more radicals between the radical represented by A1 and the radical represented by A2 include fluorine atom; and n is an integer of 2-4.