发明名称 |
Exposure apparatus and device fabrication method using the same |
摘要 |
<p>An exposure apparatus includes an original-form stage for holding an original form, a projection optical system for introducing light from the original form into an object to be exposed, and a detection optical system for detecting positions at plural points on the original form, in an optical-axis direction of the projection optical system, wherein a space for enclosing the original-form stage is different from a space for enclosing at least part of the detection optical system.</p> |
申请公布号 |
EP1515190(A2) |
申请公布日期 |
2005.03.16 |
申请号 |
EP20040021381 |
申请日期 |
2004.09.08 |
申请人 |
CANON KABUSHIKI KAISHA |
发明人 |
MORI, TETSUYA;OSAKABE, YUICHI;NISHIKAWA, TADAYASU |
分类号 |
G03F7/20;G01B11/00;G01B11/24;G03B27/42;G03F9/00;H01L21/027;(IPC1-7):G03F9/00 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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