发明名称 METHOD OF FORMING FUSE INTEGRATED WITH DUAL DAMASCENE PROCESS
摘要 A method for forming a fuse includes forming an interconnection pattern and a fuse pattern on a substrate using a damascene process. A passivation layer is formed on a surface of the substrate over the interconnection pattern and the fuse pattern. Then, the passivation layer is patterned to form a pad opening that exposes a portion of the interconnection pattern. A metal pad is formed on the interconnection pattern in the pad opening. A portion of the metal pad extends over the passivation layer. The passivation layer on the fuse pattern is partially etched to form a fuse opening.
申请公布号 KR100476938(B1) 申请公布日期 2005.03.16
申请号 KR20030012766 申请日期 2003.02.28
申请人 发明人
分类号 H01L21/82;H01L23/525;(IPC1-7):H01L21/82 主分类号 H01L21/82
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