ADAPTIVELY PLASMA SOURCE FOR GENERATING UNIFORM PLASMA

摘要

An adaptive plasma source for uniformly generating plasma is provided to improve uniformity of plasma density by arranging unit coils in spiral around a bushing. A plasma reaction chamber(200) has an inner space(204) defined by a chamber outer wall(202). A semiconductor wafer(206) is positioned on a lower portion of the inner space(204) in the plasma reaction chamber(200). The semiconductor wafer(206) is provided on a supporter(208) of the lower portion of the plasma reaction chamber(200). The supporter(208) is connected to an RF(Radio Frequency) power source that is located at outside of the plasma reaction chamber(200). A dome(212) is provided on an upper portion of the plasma reaction chamber(200). A plasma(214) is generated in a space between the dome(212) and the semiconductor wafer(206).