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发明名称
In2O3 Thin-film O3 Gas Sensors Using R.F. Magnetron Sputtering and Their Fabrication Method
摘要
申请公布号
KR100475743(B1)
申请公布日期
2005.03.15
申请号
KR20020008353
申请日期
2002.02.16
申请人
发明人
分类号
H01L21/203;(IPC1-7):H01L21/203
主分类号
H01L21/203
代理机构
代理人
主权项
地址
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