发明名称 |
COMPOSITION FOR FORMING SILICON FILM AND METHOD FOR FORMING SILICON FILM |
摘要 |
A composition for forming a silicon film containing silicon particles and a dispersing medium, and a method for forming a silicon film wherein a coating film of the above composition is formed on a substrate and then, an instantaneous fusion, a heat treatment or an optical treatment is conducted. Using the composition and method, a poly-crystal silicon film having a desired thickness that may be used as a silicon film for a solar battery can be efficiently produced in a simple and easy way.
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申请公布号 |
KR20050026692(A) |
申请公布日期 |
2005.03.15 |
申请号 |
KR20047005943 |
申请日期 |
2004.04.22 |
申请人 |
JSR CORPORATION |
发明人 |
IWASAWA, HARUO;KATO, HITOSHI;MATSUKI, YASUO |
分类号 |
C23C24/10;C23C26/02;H01L21/208;(IPC1-7):H01L21/208 |
主分类号 |
C23C24/10 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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