发明名称 COMPOSITION FOR FORMING SILICON FILM AND METHOD FOR FORMING SILICON FILM
摘要 A composition for forming a silicon film containing silicon particles and a dispersing medium, and a method for forming a silicon film wherein a coating film of the above composition is formed on a substrate and then, an instantaneous fusion, a heat treatment or an optical treatment is conducted. Using the composition and method, a poly-crystal silicon film having a desired thickness that may be used as a silicon film for a solar battery can be efficiently produced in a simple and easy way.
申请公布号 KR20050026692(A) 申请公布日期 2005.03.15
申请号 KR20047005943 申请日期 2004.04.22
申请人 JSR CORPORATION 发明人 IWASAWA, HARUO;KATO, HITOSHI;MATSUKI, YASUO
分类号 C23C24/10;C23C26/02;H01L21/208;(IPC1-7):H01L21/208 主分类号 C23C24/10
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