发明名称 |
ELECTROMAGNETIC WAVE SHIELD MATERIAL AND PROCESS FOR PRODUCING THE SAME |
摘要 |
An electromagnetic wave shield material comprising a transparent substrate and, formed thereon, a thin line pattern characterized in that the thin line pattern is comprised of a metal plating film formed using, as catalyst nuclei, metallic silver resulting from physical development; and a process for producing the electromagnetic wave shield material characterized in that it comprises exposing a lightsensitive material comprising a transparent substrate and, superimposed thereon in the following order, a physical development nuclei layer and a silver halide emulsion layer, carrying out physical development processing so as to deposit metallic silver in any arbitrary thin line pattern on the physical development nuclei layer, removing the layer provided on the physical development nuclei layer and performing metal plating with the use of metallic silver resulting from the physical development as catalyst nuclei. |
申请公布号 |
KR20050026476(A) |
申请公布日期 |
2005.03.15 |
申请号 |
KR20057000564 |
申请日期 |
2003.07.11 |
申请人 |
FUJIMORI KOGYO CO., LTD;MITSUBISHI PAPER MILLS LTD. |
发明人 |
KOBAYASHI, KAZUHISA;SUZUKI, ATSUSHI;TSUBAI, YASUO;YOSHIDA, TARO |
分类号 |
C23C18/16;C23C18/28;C25D5/56;C25D7/00;H05K9/00;(IPC1-7):C23C18/31 |
主分类号 |
C23C18/16 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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