发明名称 CATADIOPTRIC MULTI-MIRROR SYSTEMS FOR PROJECTION LITHOGRAPHY
摘要 According to one exemplary embodiment, a photolithographic reduction projection catadioptric objective is provided and includes a first optical group (G1) and a second substantially refractive optical group (G2) more image forward than the first optical group (G1). The second optical group (G2) includes a number of lens elements (E4-E 16) and has a negative overall magnifying power for providing image reduction. The first optical group (G1) has a folded geometry for producing a virtual image and the second optical group (G2) receives and reduces the virtual image to form an image with a numerical aperture of at least substantially (0.80).
申请公布号 KR20050025606(A) 申请公布日期 2005.03.14
申请号 KR20057000778 申请日期 2005.01.14
申请人 CARL ZEISS SMT AG 发明人 ULRICH, WILHELM;HUDYMA, RUSSELL
分类号 G02B17/08;G03F7/20;(IPC1-7):G02B17/08 主分类号 G02B17/08
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