发明名称 |
CATADIOPTRIC MULTI-MIRROR SYSTEMS FOR PROJECTION LITHOGRAPHY |
摘要 |
According to one exemplary embodiment, a photolithographic reduction projection catadioptric objective is provided and includes a first optical group (G1) and a second substantially refractive optical group (G2) more image forward than the first optical group (G1). The second optical group (G2) includes a number of lens elements (E4-E 16) and has a negative overall magnifying power for providing image reduction. The first optical group (G1) has a folded geometry for producing a virtual image and the second optical group (G2) receives and reduces the virtual image to form an image with a numerical aperture of at least substantially (0.80).
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申请公布号 |
KR20050025606(A) |
申请公布日期 |
2005.03.14 |
申请号 |
KR20057000778 |
申请日期 |
2005.01.14 |
申请人 |
CARL ZEISS SMT AG |
发明人 |
ULRICH, WILHELM;HUDYMA, RUSSELL |
分类号 |
G02B17/08;G03F7/20;(IPC1-7):G02B17/08 |
主分类号 |
G02B17/08 |
代理机构 |
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