PHOTOREACTIVE HIGH POLYMER MEMBRANE USING PHOTOREACTIVE ORGANIC CHEMICAL COMPOUND AND ITS MANUFACTURING METHOD

摘要

A photosensitive polymer film containing photosensitive organic compounds is provided to modify its photochemical reaction including the reaction rate and an amount of required light energy through changes in the chemical structure of the photosensitive organic compounds and processability through chemical bonding with various species of polymer compounds, and to change the arrangement tendency of the compounds having lower molecular weight in the film. The photosensitive polymer film is produced by: dissolving 0.5-20wt% of a polymer containing a photosensitive organic compound into an organic solvent with 30-300deg.C of a boiling point and 0.5-500cps of viscosity to obtain 1-200cps of viscosity; coating the dissolved polymer onto a substrate in 10-1000nm thick to form a photosensitive polymer film; irradiating the linearly polarized light by a polarizer, partially polarized light by a polarizer having a low degree of polarization or non-polarized light to the surface of the polymer film obliquely or vertically, wherein the photosensitive organic compound has a structure of a formula 1.