发明名称 |
ZIRCONIUM COMPLEX USED FOR THE CVD METHOD AND PREPARATION METHOD OF A THIN FILM USING THEREOF |
摘要 |
In the preparation of a PZT thin film by the liquid source CVD method, using zirconium tetrakis(isobutyrylpivaloylmethanate) as a zirconium precursor enables to obtain a constant composition ratio of films within a wide range of the substrate temperature, and negates the need for the thermal treatment alter the film preparation. Accordingly, the present invention provides a PZT thin film having a constant quality at a low cost.
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申请公布号 |
KR20050025973(A) |
申请公布日期 |
2005.03.14 |
申请号 |
KR20057001189 |
申请日期 |
2005.01.21 |
申请人 |
SAES GETTERS S.P.A.;TOSHIMA MFG. CO. LTD. |
发明人 |
KOJI, YODA;YUZO, TASAKI |
分类号 |
C07C49/92;C07F7/00;C23C16/00;C23C16/40;(IPC1-7):C07F7/00;C23C16/18 |
主分类号 |
C07C49/92 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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