DRIER OF WET CLEANING EQUIPMENT FOR DRYING SEMICONDUCTOR WAFER TO IMPROVE DRY IN CONTACT POINT OF WAFER WITH SUPPORT BAR OF WAFER GUIDE

摘要

PURPOSE: A drier of wet cleaning equipment for a semiconductor wafer is provided to prevent the incomplete dry in a contact point of a wafer with a support bar by positioning an injection nozzle line for supplying a drying gas so as to confront with a support bar of a wafer guide. CONSTITUTION: A plurality of wafers are received in a wafer guide(50). The wafer guide is received in a cleaning bath(30) for supplying a cleaning solution. A plurality of nozzle lines(71) located at the upper side of the cleaning bath inject a predetermined amount of a drying gas. The pressure of the drying gas supplied into the plurality of nozzle lines is uniformly dispersed by a pressure dispenser.