发明名称 LAYOUT STRUCTURE OF RECESS GATE FOR SECURING MIS-ALIGNMENT MARGIN BETWEEN GATE LINE AND ADJACENT ACTIVE REGION
摘要 PURPOSE: A layout structure of a recess gate is provided to prevent the short circuit due to mis-alignment by forming differently a gap between gate lines arranged on active regions and a gap between gate lines arranged on inactive regions. CONSTITUTION: A layout structure of a recess gate is formed on a semiconductor substrate including active regions(111) and inactive regions. The active regions are periodically arranged in a cell region and are aligned in a diagonal line. A plurality of gate lines(112) are arranged in a Y-axis of each of the active regions. A gap between the gate lines arranged on the active regions is larger than a gap between the gate lines arranged on the inactive regions. The gate lines extends to a Y-axis of each of inactive regions. The gate lines are linearly arranged on the active regions.
申请公布号 KR20050024806(A) 申请公布日期 2005.03.11
申请号 KR20030061662 申请日期 2003.09.04
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 CHO, MIN HEE;KIM, JI YOUNG
分类号 H01L27/04;(IPC1-7):H01L27/04 主分类号 H01L27/04
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