发明名称 |
LAYOUT STRUCTURE OF RECESS GATE FOR SECURING MIS-ALIGNMENT MARGIN BETWEEN GATE LINE AND ADJACENT ACTIVE REGION |
摘要 |
PURPOSE: A layout structure of a recess gate is provided to prevent the short circuit due to mis-alignment by forming differently a gap between gate lines arranged on active regions and a gap between gate lines arranged on inactive regions. CONSTITUTION: A layout structure of a recess gate is formed on a semiconductor substrate including active regions(111) and inactive regions. The active regions are periodically arranged in a cell region and are aligned in a diagonal line. A plurality of gate lines(112) are arranged in a Y-axis of each of the active regions. A gap between the gate lines arranged on the active regions is larger than a gap between the gate lines arranged on the inactive regions. The gate lines extends to a Y-axis of each of inactive regions. The gate lines are linearly arranged on the active regions.
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申请公布号 |
KR20050024806(A) |
申请公布日期 |
2005.03.11 |
申请号 |
KR20030061662 |
申请日期 |
2003.09.04 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
CHO, MIN HEE;KIM, JI YOUNG |
分类号 |
H01L27/04;(IPC1-7):H01L27/04 |
主分类号 |
H01L27/04 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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